Vibration Isolation Case Studies

Tier-1 Semiconductor Pyeongtaek P2 EUV line ADVANTEST E5610 with DVIA-P4000 (serial 240405R2). Tuning June 28, 2024. VC and Transmissibility plots per axis; Reference as Generic Vibration Criteria markdown table only.

DVIA-P4000 installation report (serial 240424R1) at Huahong for ASML E-beam wafer inspection system eScan 460. Tuning 2024-09-12; report written 2024-09-19. Equipment installed on the platform and turned off during measurement. Publishes vertical, left-to-right, and front-to-back VC curves. Word cover graphic omitted; Reference uses the standard Generic Vibration Criteria markdown table.

DVIA-P4000 (serial 240607R3) follow-up inspections at Toppan Photomask CLB after KLA LMS IPRO4 placement—Vib LED, image stability, and grating vibration. Publishes vibration specification graphic; measurement data referenced in conclusion were provided to the customer separately.

DVIA-P4000 (serial 240607R3) tuning and vibration measurement at Toppan Photomasks CLB with KLA LMS IPRO4 installed on the platform. Publishes vibration specification and floor vibration limit curves by axis.

Korea Nano Technology Institute 2F Nano Litho/Pattern Support Line JEOL JBX-8100FS electron beam lithography DVIA-P2200 (240705R1) tuning and vibration measurement report dated January 10, 2025. Vibration specification diagram, VC / Autospectrum / Transmissibility plots by axis, measurement summary table, and equipment photo.

DVIA-P2200 (serial 240705R1) tuning and vibration measurement at Korea Nano Technology Institute 2F Nano Resource/Pattern Support Line with JEOL JBX-8100FS electron beam lithography. Tuning date October 29, 2024; engineer Chaewon Lee (DAEIL SYSTEMS). Published figures: equipment photo, vibration specification diagram, axis VC/Narrowband/Transmissibility plots, and Control Unit comparison curves. Reference uses the Generic Vibration Criteria markdown table only.