DVIA-ULF Series
Feedback measures vibration on the isolated mass and counters it in real time. Feedforward reads the floor and cancels disturbances before they arrive. Together, they deliver exceptional low-frequency isolation. Your instruments operate as if the vibration doesn't exist.
How it worksPassive Isolation (Spring & Damper):
Without active controls, the spring (k) and damper try to absorb shocks. However, at low frequencies, they can actually amplify the floor disturbance (d), causing the mass to resonate.
Feedforward Control:
Leverages ground sensor data to proactively command the actuators, nullifying floor vibrations before they reach the isolated mass.
Feedback Control:
Continuously measures the isolated mass's residual vibration (y) and uses the actuators to counteract it in real time.
Together, these advanced control mechanisms significantly enhance isolation performance, keeping the mass nearly perfectly still!
Toggle to observe how feedback and feedforward mechanisms counteract low-frequency floor vibrations.
Floor Disturbance
Simulate low-frequency vibration
Feedforward Control
Proactive floor sensing
Feedback Control
Reactive mass correction
The DVIA-ULF UI displays real-time vibration levels, actuator response, and sensor output across all six axes. Every data can be automatically logged. Review historical trends, export reports, or verify isolation performance at any time. No hidden processes. No black-box algorithms. Your facility team sees exactly what the system is doing, why it's responding, and how it's performing against specification.
Introducing the DVIA-ULF: a groundbreaking active vibration isolation platform engineered to meet the exacting demands of today's most sensitive instruments—such as electron microscopes and other precision research tools.
The all-new DVIA-ULF isolator height is unbelievably low, slim and light enough to fit under a microscope's base frame. The DVIA-ULF isolator does not raise the microscope height.
The all-new DVIA-ULF isolator height is unbelievably low, slim and light enough to fit under
a microscope's base frame. The DVIA-ULF isolator does not raise the microscope height.
The DVIA-ULF model that is the lowest active vibration isolator DAEIL SYSTEMS has ever designed.
Lowest height ever designed Microscope height remains the same.
The DVIA-ULF isolators feature a low-profile design, with an overall height of only 91 mm, allowing direct placement under microscope bases. This side-access design eliminates the need for cranes, forklifts, or other rigging equipment during installation. Each isolator is slim enough to fit directly under the microscope's frame, allowing side insertion with minimal clearance.
The DVIA-ULF isolators feature a low-profile design, with an overall height of only 91 mm, allowing direct placement under microscope bases. This side-access design eliminates the need for cranes, forklifts, or other rigging equipment during installation. Each isolator is slim enough to fit directly under the microscope's frame, allowing side insertion with minimal clearance.
Straightforward Installation. No heavy lifting.
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The modular design of the DVIA-ULF allows seamless scalability. Users can effortlessly add units tailored precisely to their microscope's dimensions and weight, from compact research SEMs to large-scale TEMs. Each setup can be individually optimized according to specific weight and geometric requirements. Installation requires no extensive site preparation, making it ideal for modern cleanrooms and space-constrained laboratories. Its streamlined design integrates effortlessly into existing configurations, delivering exceptional vibration isolation even in challenging low-frequency environments.
The modular design of the DVIA-ULF allows seamless scalability. Users can effortlessly add units tailored precisely to their microscope's dimensions and weight, from compact research SEMs to large-scale TEMs. Each setup can be individually optimized according to specific weight and geometric requirements. Installation requires no extensive site preparation, making it ideal for modern cleanrooms and space-constrained laboratories. Its streamlined design integrates effortlessly into existing configurations, delivering exceptional vibration isolation even in challenging low-frequency environments.
Custom modular design solution for every microscope.
The DVIA-ULF supports SEMs, nanoscale imaging tools, and precision
metrology systems across five application domains. Each configuration
is engineered to the specific measurement requirements of the instrument.
Floor vibrations blur electron beam images above 50,000× magnification. The DVIA-ULF
slides beneath the base frame at 91 mm and cancels disturbances from 0.5 Hz. No change
to microscope height. No compromise in clarity.
Laser interferometry and alignment systems depend on
sub-micron optical path stability. Low-frequency floor
motion corrupts phase measurement and beam pointing.
The DVIA-ULF holds the optical bench steady in all axes.
3D profilometers and white-light interferometers
resolve sub-nanometer surface features. Imperceptible
floor vibration degrades Z-axis resolution. The DVIA-ULF
removes the noise floor before it reaches the probe.
AFM tip–sample interactions measure forces at the atomic
scale. Any floor disturbance translates directly into measurement
noise. The DVIA-ULF delivers sub-micron translational and
sub-microradian angular stability across the full bandwidth.
X-ray diffraction, reflectometry, and fluorescence all require
vibration-free sample positioning. Low-frequency vibrations
broaden diffraction peaks and distort thin-film measurements.
The DVIA-ULF restores data integrity.
The DVIA-ULF delivers up to 100 N of combined actuator force, directly countering floor vibrations in the 1–10 Hz range where precision instruments are most sensitive. Consistent isolation, even on challenging floors like VC-A.The DVIA-ULF delivers up to 100 N of combined actuator force, directly countering floor vibrations in the 1–10 Hz range where precision instruments are most sensitive. Consistent isolation, even on challenging floors like VC-A.
The DVIA-ULF isolators integrate into two platform configurations, each engineered to your metrology tool's specifications. Both platforms share the same isolation performance. Same 91 mm isolators. Same 6DOF active control. Same feedback and feedforward algorithms. The platform adapts to your tool. The isolation stays constant.
A tabletop-height workstation with isolators built into the structure. Designed for compact SEMs and nanoscale imaging tools where operator ergonomics and workspace integration matter. Height, depth, and cable routing configured to your facility layout.
A floor-standing structure that houses the isolators beneath the instrument. Designed for heavier SEMs and dual-beam systems where direct floor mounting is required. Custom dimensions, load paths, and mounting interfaces configured per tool model.
Specifications
Verified on-site. All performance claims are measured under controlled conditions and confirmed during installation. Maximum load capacity scales with additional isolators. Width and depth customizable per instrument.
Proven in the field. Installed in the world's most advanced semiconductor, aerospace, and research facilities.
Every system measured and verified on-site.
Tell us your microscope model and facility conditions. We'll engineer the configuration.
A hardware amplifier boosts low-frequency gain.
A digital filter refines the signal. Together, they extend
accurate detection and isolation down to 0.3 Hz.
A floating-point DSP delivering 1800 MFLOPS
processes vibration data in real time.
Response time: 0.5 ms. By the time vibrations reach
your microscope, it's already been cancelled.
11 Geophone velocity sensors with 2.55 V/in/s sensitivity and just 0.15% distortion. They capture low frequency vibrations other systems miss entirely so the DVIA-ULF can cancel what it can't ignore.
The DVIA-ULF controls all six degrees of freedom independently. Its algorithm decouples each axis, eliminating cross-coupling. Sub-micron translational and sub-microradian angular stability, maintained simultaneously.
Less than 0.05 μT magnetic field. Electron beams are sensitive to the smallest magnetic interference. The DVIA-ULF is engineered to be magnetically silent — your beam stays true, your images stay sharp.
