Installation Report
DVIA-ULF Series
12-31-2025
ZEISS FE-SEM Sigma 360 DVIA-ULF700 Installation Report
DVIA-ULF Series
Installation Report
ZEISS
Sigma 360
DVIA-ULF700
Contents
Overview
The DVIA-ULF700 active vibration isolation platform is appropriately installed and functioning as intended.
Vibration Isolation System Information
Model: DVIA-ULF700
Serial Number: 251212R1
Engineer
Chaewon Lee DAEIL SYSTEMS
Tuning Date
December 31, 2025
End User
N/A
Number of Tuning Trial
1st
Location
N/A
Equipment
Manufacturer: ZEISS
Equipment: FE-SEM
Model: Sigma 360
Vibration Specification
Equipment Condition
The equipment is turned on/IDLE
Tuning Request
N/A
Measurement Summary
| Measurement Point | Status | Axis | Floor | DVIA-ULF700 |
|---|---|---|---|---|
| 1.Floor 2.DVIA-ULF700 | Sigma 360 is turned on/IDLE | Vertical | VC-A @ 16 Hz | VC-G @ 16 Hz |
| Left to Right | VC-D @ 12.5 Hz | VC-G @ 12.5 Hz | ||
| Front to Back | VC-B @ 16 Hz | VC-G @ 16 Hz |
Measurement Data Obtained via UI Program
Vertical VC Curves
Vertical Autospectrum
Vertical Transmissibility
Left to Right VC curves
Left to Right Autospectrum
Left to Right Transmissibility
Front to Back VC Curves
Front to Back Autospectrum
Front to Back Transmissibility
Equipment picture
13. Reference
| Criterion Curve | Description | Amplitude µm/s (µin/s) | Detail Size µm |
|---|---|---|---|
| Workshop (ISO) | Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas. | 800 (32,000) | N/A |
| Office (ISO) | Perceptible vibration. Appropriate to offices and non-sensitive areas. | 400 (16,000) | N/A |
| Residential Area (ISO) | Barely perceptible vibration. Appropriate to sleep areas in most instances. | 200 (8,000) | 75 |
| Operating Theatre (ISO) | Vibration not perceptible. Suitable for surgical suites, microscopes to 100x. | 100 (4,000) | 25 |
| VC-A | Adequate for optical microscopes to 400x, microbalances, optical balances. | 50 (2,000) | 8 |
| VC-B | Appropriate for inspection and lithography equipment to 3μm line widths. | 25 (1,000) | 3 |
| VC-C | Appropriate for optical microscopes to 1000x, lithography equipment to 1μm. | 12.5 (500) | 1 - 3 |
| VC-D | Suitable for demanding equipment including electron microscopes (SEMs/TEMs). | 6.25 (250) | 0.1 - 0.3 |
| VC-E | For the most demanding systems including E-Beam lithography at nanometer scales. | 3.12 (125) | < 0.1 |
| VC-F | For extremely quiet research spaces. Not recommended as design criterion. | 1.56 (62.5) | N/A |
| VC-G | For extremely quiet research spaces. Not recommended as design criterion. | 0.78 (31.25) | N/A |
*Notes:*
1. VC-A/B is measured in one-third octave bands over 8-80 Hz, VC-C through VC-G from 1-80 Hz.
2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.
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Case Study Information
Category
Installation Report
SeriesDVIA-ULF Series
Date12-31-2025
Tags
DVIA-ULF Series
Installation Report
ZEISS
Sigma 360
DVIA-ULF700
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