ZEISS FE-SEM Sigma 360 DVIA-ULF700 Installation Report

DVIA-ULF Series

Installation Report

ZEISS

Sigma 360

DVIA-ULF700

Overview

The DVIA-ULF700 active vibration isolation platform is appropriately installed and functioning as intended.

Model: DVIA-ULF700

Serial Number: 251017R2

Chaewon Lee DAEIL SYSTEMS

February 27, 2026

N/A

1st

N/A

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

The equipment is turned on/IDLE

N/A

Measurement Point	Status	Axis	Vibration Specification	Floor	DVIA-ULF700	Floor	DVIA-ULF700
1.Floor 2.DVIA-ULF700	Equipment is Turned on/IDLE	Vertical	Refer to item 9	VC-D @ 3.15 Hz	VC-G @ 3.15 Hz	✗ FAIL	✓ PASS
		Left to Right	Refer to item 9	VC-D @ 3.15 Hz	VC-G @ 3.15 Hz	✗ FAIL	✓ PASS
		Front to Back	Refer to item 9	VC-D @ 3.15 Hz	VC-G @ 3.15 Hz	✗ FAIL	✓ PASS

Photo Not Allowed

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A