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Installation Report
DVIA-ULF Series
03-18-2026

YIMO ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report (retuning after degraded performance)

DVIA-ULF Series
Installation Report
YIMO
ZEISS
Sigma 360
FE-SEM
DVIA-ULF700

Overview

Due to the degraded performance of DVIA-ULF700, retuning was performed.

After retuning, DVIA-ULF700 is performing as intended.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 250923R3

Engineer

Chaewon Lee from DAEIL SYSTEMS

Tuning Date

March 18, 2026

End User

N/A

Number of Tuning Trial

2nd(1st: 25.12.18))

Location

N/A

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement PointStatusAxisVibrationSpecificationFloorDVIA-ULF700FloorDVIA-ULF700
1.Floor
2.DVIA-ULF700
Equipment is Turned on/IDLEVerticalRefer to item 9VC-E @ 4 HzVC-G @ 4 HzFAILPASS
Left to RightVC-E @ 2.5 HzVC-G @ 2.5 HzPASSPASS
Front to BackVC-E @ 1.6 HzVC-G @ 1.6 HzPASSPASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date03-18-2026
Tags
DVIA-ULF Series
Installation Report
YIMO
ZEISS
Sigma 360
FE-SEM
DVIA-ULF700