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Installation Report
DVIA-P Series
10-23-2025

Tier-1 Semiconductor Hwaseong ZEISS AIMS™ 1X-193i DVIA-P4000 (034014B) Installation Report

DVIA-P Series
Installation Report
Tier-1 Semiconductor
Hwaseong
ZEISS
AIMS 1X-193i
DVIA-P4000

Overview

Inspection and vibration measurement were conducted on the DVIA-P4000 installed at Tier-1 Semiconductor Hwaseong site NRD Line 3F 7bay.

Inspection included equipment installation and IDLE configuration.

On the initial visit, structural elements installed above the vibration isolation platform interfered with its motion and were removed prior to tuning work.

A booth structure adjoining the qualification equipment perimeter was coupled to the vibration isolation platform, and elevated vibration emanating from the booth was observed; such inputs can affect vibration isolation performance and measurement outcomes.

The vibration isolation platform was Turned off on the initial visit; vibration data under Turned off as well as under active tuned conditions after service were captured for comparison.

Data are plotted as VC curves with reference criterion context.

Vibration isolation platform

Model: DVIA-P4000

Serial Number: 034014B

Engineer

Chaewon Lee, DAEIL SYSTEMS FIELD ENGINEER

Inspection Date

October 23, 2025

Installation Site

Tier-1 Semiconductor Hwaseong site NRD Line 3F 7bay

End User

Tier-1 Semiconductor

Customer equipment

Manufacturer: ZEISS

Equipment: Photomask Qualification

Model: AIMS™ 1X-193i

Equipment Specification

VC-C

Equipment Status

Equipment installed and IDLE

Measuring instruments

10.1) Data Physics DAQ

– Hardware: QUATTRO, Serial Number: 22436

– Software: SignalCalc ACE

10.2) Accelerometer

– PCB Accelerometer

– Model: 393B05

Measuring set-up

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

On initial inspection with the vibration isolation platform Turned off, all axes were SPEC out-of-spec.

After tuning service, measurements met the specification across all axes.

Measurement Data

Measuring PointStatusDirectionSpecificationMeasurement (floor — Turned off)Measurement (DVIA-P4000 — Turned off)Result (floor)Result (DVIA-P4000)
Turned offDVIA-P4000Turned offDVIA-P4000
Tier-1 Semiconductor Hwaseong site NRD Line 3F 7bay
1. Turned off
2. DVIA-P4000
Equipment installed and IDLEVerticalVC-CVC-B @ 31.5 HzVC-E @ 31.5 HzFAILPASS
Left to RightVC-B @ 40 HzVC-E @ 40 HzFAILPASS
Front to BackVC-B @ 31.5 HzVC-C @ 31.5 HzFAILPASS

Data and Image

Vertical VC Curves

Vertical Autospectrum

Left to Right VC Curves

Left to Right Autospectrum

Front to Back VC Curves

Front to Back Autospectrum

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date10-23-2025
Tags
DVIA-P Series
Installation Report
Tier-1 Semiconductor
Hwaseong
ZEISS
AIMS 1X-193i
DVIA-P4000