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Installation Report
DVIA-ULF Series
04-13-2026

NAURA Technology Group Beijing TESCAN CLARA FE-SEM DVIA-ULF700 (250902R6) installation report — 2026-04-13

DVIA-ULF Series
Installation Report
NAURA Technology Group
TESCAN
CLARA
FE-SEM
Beijing
DVIA-ULF700
250902R6

Overview

After retuning the DVIA-ULF700 active vibration isolation platform is appropriately functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 250902R6

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

April 13, 2026

End User

NAURA Technology Group

Number of Tuning Trial

2nd(1st: 25.12.10)

Location

Beijing, China

Equipment

Manufacturer: TESCAN

Equipment: FE-SEM

Model: CLARA

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

Measurement Summary

Measurement PointStatusAxisVibration SpecificationFloor RMS (μm/s)DVIA-ULF700 RMS (μm/s)Floor ResultDVIA-ULF700 Result
1.Floor 2.DVIA-ULF700Equipment is Turned on/IDLEVerticalBased on Vibration Specification Pneumatic7.21 @ 14.7 Hz0.08 @ 14.7 HzFAILPASS
Left to Right3.33 @ 14.8 Hz0.025 @ 14.8 HzPASSPASS
Front to Back0.86 @ 14.8 Hz0.004 @ 14.8 HzPASSPASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

13. Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude µm/s (µin/s)Detail Size µm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date04-13-2026
Tags
DVIA-ULF Series
Installation Report
NAURA Technology Group
TESCAN
CLARA
FE-SEM
Beijing
DVIA-ULF700
250902R6