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Installation Report
DVIA-ULF Series
04-29-2026

Korea Institute of Science and Technology (KIST) TESCAN Clara FE-SEM DVIA-ULFB700 Installation Report — 2026.04.29

DVIA-ULF Series
Installation Report
KIST
Korea Institute of Science and Technology
TESCAN
Clara
FE-SEM
DVIA-ULFB700
260227R2

Customer

Korea Institute of Science and Technology

Author

N/A

Engineer

Chaewon Lee from DAEIL SYSTEMS

Installation Date

April 28, 2026

Report Written Date

April 29, 2026

Overview

Tuning and vibration measurement were conducted on the DVIA-ULFB700 installed at the Korea Institute of Science and Technology, L0 Building, room 184.

Tuning and vibration measurement were performed with the equipment in Turned on/IDLE state.

During tuning and measurement, the cooling fan installed under the Clara tool was operating, and airflow from the cooling fan was found to be delivered directly to the isolation platform top plate. Such external airflow can affect tuning and vibration measurement results.

After plotting data as VC curves, reference material on vibration levels is provided.

Vibration Isolation System Information

Model: DVIA-ULFB700

Serial Number: 260227R2

Tuning Date

April 28, 2026

Installation Site

Korea Institute of Science and Technology, L0 Building, room 184

End User

Korea Institute of Science and Technology

Customer Equipment

Manufacturer: TESCAN

Equipment: FE-SEM

Model: Clara

Equipment specification

< 5 um/s below 30 Hz; < 10 um/s above 30 Hz

Equipment Status

장비 설치 및 Turned on/IDLE

Measuring equipment

10.1) Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

10.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measurement setup

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

From about 16 Hz upward, owing to influence of the cooling fan installed above the isolation platform, vibration measured on the DVIA-ULFB700 exceeds floor vibration values. This is not an isolation platform deficiency; vibrations from equipment operation plus airflow originating from the cooling fan were captured in the measurements.

Measurement summary values appended here are taken in bands that are less affected by the cooling fan.

In bands not affected by the cooling fan, VC-G vibrations are measured in all directions.

Vibration specification is satisfied in all directions.

Measurement Summary

Measurement siteStateVibration specificationDirectionFloor vibrationDVIA-ULFB700Floor vibrationDVIA-ULFB700
Korea Institute of Science and Technology, L0 Building, room 184
1. Floor vibration
2. DVIA-ULFB700
Turned on/ IDLEup to 30 Hz < 5 um/s
above 30 Hz <10 um/s
VerticalVC-D @ 16 HzVC-G @ 16 HzPASSPASS
Left to RightVC-F @ 20 HzVC-G @ 20 HzPASSPASS
Front to BackVC-G @ 12.5 HzVC-G @ 12.5 HzPASSPASS

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date04-29-2026
Tags
DVIA-ULF Series
Installation Report
KIST
Korea Institute of Science and Technology
TESCAN
Clara
FE-SEM
DVIA-ULFB700
260227R2