Installation Report

DVIA-ULF Series

11-11-2025

Zhuzhou Smelter Group ZEISS EVO 10 FE-SEM DVIA-ULFB700 Installation Report

DVIA-ULF Series

Installation Report

Zhuzhou Smelter Group

ZEISS

EVO 10

FE-SEM

DVIA-ULFB700

Prepared by

Engineer: Chaewon Lee

Tuning date: 25.11.10

Report written date: 25.11.11

Overview

The DVIA-ULFB700 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULFB700

Serial Number: 250804R5

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

November 10, 2025

End User

Zhuzhou Smelter Group

Number of Tuning Trial

1st

Location

Zhuzhou

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: EVO 10

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

Measurement Summary

Measurement Point	Status	Axis	Floor	DVIA-ULFB700
1.Floor 2.DVIA-ULFB700	EVO 10 turned on/IDLE	Vertical	VC-E @ 50 Hz	VC-G @ 50 Hz
		Left to Right	VC-G @ 20 Hz	VC-G @ 20 Hz
		Front to Back	VC-G @ 16 Hz	VC-G @ 16 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (μin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

*Notes:*

1. VC-A/B is measured in one-third octave bands over an 8-80 Hz frequency range while VC-C through VC-G is measured over the 1-80 Hz frequency range (per ISO VC curves).

2. Detail size refers to line width for microelectronics fabrication or particle size for medical technology.

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Case Study Information

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