Installation Report

DVIA-ULF Series

09-05-2025

ZEISS FE-SEM Sigma 360 DVIA-ULFB700 (250529R5) Installation Report

DVIA-ULF Series

Installation Report

ZEISS

Sigma 360

FE-SEM

DVIA-ULFB700

250529R5

Prepared by

Engineer: Chaewon Lee

Tuning date: 25.09.04

Report written date: 25.09.05

Overview

The DVIA-ULFB700 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULFB700

Serial Number: 250529R5

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

September 04, 2025

End User

N/A

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Equipment Condition

The equipment is installed/Turned off

Tuning Request

N/A

Measurement Summary

Measurement Point	Status	Axis	Floor	DVIA-ULFB700
1.Floor 2.DVIA-ULFB700	Sigma 360 is Installed/Turned off	Vertical	VC-C@ 3.15 Hz	VC-G@ 3.15 Hz
		Left to Right	VC-E@ 3.15 Hz	VC-G@ 3.15 Hz
		Front to Back	VC-E@ 3.15 Hz	VC-G@ 3.15 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Criterion Curve	Description	Amplitude μm/s (μin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

*Notes:*

1. VC-A/B is measured in one-third octave bands over an 8-80 Hz frequency range while VC-C through VC-G is measured over the 1-80 Hz frequency range (per ISO VC curves).

2. Detail size refers to line width for microelectronics fabrication or particle size for medical technology.