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Installation Report
DVIA-ULF Series
01-21-2026

YIMO ZEISS EVO 10 DVIA-ULF1000 (251104R1) Installation Report

DVIA-ULF Series
Installation Report
YIMO
ZEISS
EVO 10
SEM
Huasheng Lianying
DVIA-ULF1000
251104R1

Contents

Overview

The DVIA-ULF1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULF1000

Serial Number: 251104R1

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

January 21, 2026

End User

Huasheng Lianying Vibration Damping Platform

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: ZEISS

Equipment: SEM

Model: EVO 10

Vibration Specification

up to 30 Hz : VC-D

above 30 Hz : VC-C

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement PointStatusAxisMeasurement Data
FloorDVIA-ULF1000
1.Floor2.DVIA-ULF1000YF-1801 is turned on/IDLEVerticalVC-D@ 6.3 HzVC-G@ 6.3 Hz
Left to RightVC-E@ 1.25 HzVC-G@ 1.25 Hz
Front to BackVC-D@ 5 HzVC-G@ 5 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date01-21-2026
Tags
DVIA-ULF Series
Installation Report
YIMO
ZEISS
EVO 10
SEM
Huasheng Lianying
DVIA-ULF1000
251104R1

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