Installation Report

DVIA-ULF Series

12-18-2025

Kunshan DeKaiYiTe ZEISS FE-SEM Sigma 360 DVIA-ULF700 Installation Report

DVIA-ULF Series

Installation Report

Kunshan DeKaiYiTe

ZEISS

Sigma 360

FE-SEM

DVIA-ULF700

Overview

The DVIA-ULF700 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 250923R3

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

December 18, 2025

End User

-Kunshan DeKaiYiTe

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement Point	Status	Axis	Floor	DVIA-ULF700
1.Floor 2.DVIA-ULF700	Sigma is turned on/IDLE	Vertical	VC-C @ 40 Hz	VC-G @ 40 Hz
		Left to Right	VC-F @ 12.5 Hz	VC-G @ 12.5 Hz
		Front to Back	VC-F @ 12.5 Hz	VC-G @ 12.5 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

13. Reference

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A