COPPRO ZEISS EVO10 DVIA-UB700 (220310R1) Installation Report — Chengdu, China

DVIA-UB Series

Installation Report

DVIA-UB700

220310R1

COPPRO

ZEISS

EVO10

Chengdu

China

Prepared for

COPPRO

（成都振芯科技股份有限公司）

Engineer: Youngha Lee

Tuning date: 22.07.26

Report written date: 22.07.27

Date of business trip : 17.12.27~17.12.29

The DVIA-UB700 active vibration isolation platform is appropriately installed and functioning as intended.

Model: DVIA-UB700

Serial Number: 220310R1

Youngha Lee from DAEIL SYSTEMS

July 26, 2022

CHENGDU, China

ZEISS EVO10

Measurement Point	VC curves	Z-axis (Vertical)<br />1-10 Hz	Z-axis (Vertical)<br />10-80 Hz	X-axis (Left to Right)<br />1-10 Hz	X-axis (Left to Right)<br />10-80 Hz	Y-axis (Front to Back)<br />1-10 Hz	Y-axis (Front to Back)<br />10-80 Hz
Floor		C	C	D	D	D	C
Active		F	E	F	E	F	F

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A