Thermofisher Scientific Helios G4 UC DualBeam HR-S/TEM DVIA-MB1000 Installation Report
1. Measurement Details
Measurement Date
June 24, 2019
Measurement Devices
1. LAN-XI Data Acquisition Hardware
– Brüel & Kjæ r 3050-A-040 (Serial Number: 3050-111438)
2. Data Analysis Software
– Brüel & Kjæ r PULSE LAB SHOP 14
3. Sensors
– PCB Accelerometer
– Model: 393B05 (Serial Number: 48995, 40626)
Measurement Location
1
st
Floor
Measurement Setup
Bandwidth: 0 – 100 Hz
Lines: 400
Window: Hanning
Averaging: Fast Fourier Transform Spectrum Averaging
Amplitude Units: m/s2
Spectral Unit: RMS
2. Equipment Information
Manufacturer
FEL
Model
HELIOS G4 UC DualBeam System FIB S/TEM
Floor Vibration Specification
| Vertical | Left to right | Front to back |
|---|---|---|
| Helios G4 UX with or without enclosure, no HWL; 0.6nm; Stub, 0 Tilt | F | G |
| Helios G4 UX with or without enclosure, with HWL; 0.6nm; Stub, 0 Tilt | E | F |
| Helios G4 CX with or without enclosure, no HWL; 0.7 nm F (STEM) / 0.8 nm (no STEM); Stub, 0 Tilt | F | G |
| Helios G4 CX with or without enclosure, with HWL; 0.7 E nm (STEM) / 0.8 nm (no STEM); Stub, 0 Tilt | E | F |
| Helios G4 FX/HX with or without enclosure, no HWL; 0.6nm; Shuttle,0 Tilt | F | G |
| Helios G4 FX/HX with or without enclosure, with HWL; 0.6nm; Shuttle,0 Tilt | E | F |
3. Vibration Isolation System Information
Model: DVIA-MB3000
| Platform Dimensions | 1140 x 910 x 224 mm | |
|---|---|---|
| Load Capacity | 1500 - 3500 kg | |
| Actuator | Electromagnetic Actuator | |
| Maximum Actuator Force | Vertical: 40N, Horizontal: 20 N | |
| Degrees of Freedom | 6 degrees | |
| Active Isolation Range | 0.5 - 100 Hz | |
| Vibration Isolation at 2 Hz | ≥90% | |
| Vibration Isolation at 10 Hz | ≥90% | |
| Input Voltage (V) | AC100 - 240V / 50 - 60 Hz / 1A | |
| Power Consumption (W) | Maximum 110W, <50 W in normal operation | |
| Operating Range | Temperature (°C) | 5 - 50 °C |
| Humidity (%) | 20 - 90% | |
| Required Air Pressure | ≥ 0.5 MPa | |
4. Installation Photos
5. Summary
Floor Vibration Specification
---
| Frequency Range | 1 - 80 Hz | ||
|---|---|---|---|
| Floor Vibration Specification | VC-F | VC-G | VC-G |
| Measurement Direction | Z-axis | ||
| (Vertical) | X-axis | ||
| (Left to Right) | Y-axis | ||
(Front to Back)
| Floor Vibration | Fail | Fail | Fail | ||
|---|---|---|---|---|---|
| Vibration On Active Vibration Isolation System | Pass | Pass | Pass | ||
6. Results
Z-axis (Vertical)
The measured vertical floor vibration did not meet the vibration specification VC-F.
The active vibration isolation system reduced the vertical floor vibration from VC-D to VC-F.
X-axis (Left to Right)
The measured X-axis floor vibration did not meet the floor vibration specification VC-D.
The active vibration isolation system reduced the X-axis floor vibration from VC-D to VC-G.
Y-axis (Front to Back)
The measured Y-axis floor vibration did not meet the floor vibration specification VC-G.
The active vibration isolation system reduced the Y-axis floor vibration from VC-D to VC-G.
7. Reference
Generic Vibration Criteria
| Criterion Curve | Description | Amplitude µm/s (µin/s) | Detail Size µm |
|---|---|---|---|
| Workshop (ISO) | Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas. | 800 (32,000) | N/A |
| Office (ISO) | Perceptible vibration. Appropriate to offices and non-sensitive areas. | 400 (16,000) | N/A |
| Residential Area (ISO) | Barely perceptible vibration. Appropriate to sleep areas in most instances. | 200 (8,000) | 75 |
| Operating Theatre (ISO) | Vibration not perceptible. Suitable for surgical suites, microscopes to 100x. | 100 (4,000) | 25 |
| VC-A | Adequate for optical microscopes to 400x, microbalances, optical balances. | 50 (2,000) | 8 |
| VC-B | Appropriate for inspection and lithography equipment to 3μm line widths. | 25 (1,000) | 3 |
| VC-C | Appropriate for optical microscopes to 1000x, lithography equipment to 1μm. | 12.5 (500) | 1 - 3 |
| VC-D | Suitable for demanding equipment including electron microscopes (SEMs/TEMs). | 6.25 (250) | 0.1 - 0.3 |
| VC-E | For the most demanding systems including E-Beam lithography at nanometer scales. | 3.12 (125) | < 0.1 |
| VC-F | For extremely quiet research spaces. Not recommended as design criterion. | 1.56 (62.5) | N/A |
| VC-G | For extremely quiet research spaces. Not recommended as design criterion. | 0.78 (31.25) | N/A |
Notes:
1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.
2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.
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