Skip to main content
Installation Report
12-18-2025

ZEISS Sigma360 DVIA-ULF700 Installation Report

DVIA-ULF Series
Installation Report
ZEISS

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 250923R3

Engineer

Chaewon Lee from DAEIL SYSTEMS

Tuning Date

December 18, 2025

End User

Unknown

Number of Tuning Trial

First

Location

Unknown

Equipment

Manufacturer: ZEISS

Equipment: Sigma 360

Model: DVIA-ULF700

Vibration Specification

Equipment Condition

The equipment is turend on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement PointStatusAXISMeasurement Data
FloorULF700
1. Floor
2. ULF700
Sigma is turend on/IDLEVerticalVC-C
@ 40 Hz
VC-G
@ 40 Hz
Left to RightVC-F
@ 12.5 Hz
VC-G
@ 12.5 Hz
Front to BackVC-F
@ 12.5 Hz
VC-G
@ 12.5 Hz

Measurement Data Obtained via UI Program

Vertical VC Curve

Vertical Auto Spectrum

Vertical Transmissibility

Left to Right VC Curve

Left to Right Auto Spectrum

Left to Right Transmissibility

Front to Back VC Curve

Front to Back Auto Spectrum

Front to Back Transmissibility

Equipment Picture

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
µm/s (µin/s)
Detail Size
µm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

Share this Case Study

Case Study Information

Category
Installation Report
Date12-18-2025
Tags
DVIA-ULF Series
Installation Report
ZEISS