Installation Report

08-11-2022

Hengyu Biotech Hitachi HT7800 TEM DVIA-M1000 (220328R4) Installation Report

DVIA-M Series

Installation Report

Hitachi

HT7800

TEM

DVIA-M1000

220328R4

Jiashan

Hengyu Biotech

Equipment picture

Target equipment

HITACHI 7800

Place of installation

JIASHAN

Remark

Good Performance

END USER

HENGYU BIOTECH（恒驭生物）

Installation operator

Yu, Ho Sang

Date of setup

22.08.09

Date of reporting

22.08.11

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement date

2022.08.09 (Tuesday),

Measurement operator

DAEIL SYSTEMS, Hosang Yu

Place of measurement

JIASHAN

Equipment Model

HITACHI 7800

MB1000 internal program performance measurement result

Z axis

Image 2 — Hengyu Biotech Hitachi HT7800 TEM DVIA-M1000 (220328R4) Installation Report

X axis

Image 3 — Hengyu Biotech Hitachi HT7800 TEM DVIA-M1000 (220328R4) Installation Report

Y axis

Image 4 — Hengyu Biotech Hitachi HT7800 TEM DVIA-M1000 (220328R4) Installation Report

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

Share this Case Study

Case Study Information